Self-aligned quadruple patterning (SAQP) is an aggressive multi-patterning technique that is used with ArF (193 nm wavelength) immersion lithography to achieve pitches as low as 19 nm, i.e. one-fourth of the minimum pitch resolvable with a 1.35 numerical aperture (NA) [1]. Traditionally, it has been used for one-dimensional patterns such as active area fins or bit lines in me...
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Multiple Patterns: Multiple Patterns | Frederick Chen | Substack