No semiconductor process module is more operationally and executionally sensitive to contamination than the EUV lithography machine. Each EUV exposure is extremely expensive. Any particle on the imaged portion of an EUV mask would print a defect on thousands of wafers in a day. These masks that are loaded in from outside, and may become contaminated in the process. As in DUV ...
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Website title: Exposing EUV | Frederick Chen | Substack