One of the fundamentally unavoidable aspects of using EUV light is that it is universally absorbed by all materials, leading to ionization, i.e., the release of electrons. For EUV resists, this is an essential part of their function, to store the image projected from a mask as a three-dimensional pattern of openings or blocks in a polymer film. Furthermore, the layer(s) under...
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Website title: Exposing EUV | Frederick Chen | Substack